Device and method for optimizing photochemical treatment of materials

摘要

The invention relates to a method and device for optimizing photochemical treatment of optional materials provided with additives by means of irradiation. The invention consists of a radiation room (6) in which the material to be irradiated is closely guided past a cooled radiation unit (1) in an air atmosphere. Said unit does not touch the material to be treated and consists of at least one reflector unit (3) arranged parallel to the unit. According to the invention, almost the entire emitted irradiation is directed with shortest irradiation paths to the material (14) which is to be treated.