发明名称 TREATMENT APPARATUS USING HIGH FREQUENCY WAVES AND METHOD FOR CONTROLLING SAME
摘要 The present invention relates to a treatment apparatus using high frequency waves, and to a method for controlling same. The treatment apparatus using high frequency waves comprises: a high frequency wave generating unit; a plurality of needles for providing, into the skin of a user, high frequency energy transferred from the high frequency wave generating unit; and a driving unit for inserting the plurality of needles into the skin of the user, wherein the apparatus further comprises a control unit for controlling the driving unit such that the plurality of needles are inserted into a first target point within the skin and then move to a second target point.
申请公布号 US2016271410(A1) 申请公布日期 2016.09.22
申请号 US201615167467 申请日期 2016.05.27
申请人 Lutronic Corporation 发明人 Ko Kwang Chon
分类号 A61N1/40;A61N1/32;A61H39/00;A61N1/06;A61B5/053;A61B5/00 主分类号 A61N1/40
代理机构 代理人
主权项 1. A treatment method using RF treatment apparatus, the treatment method comprising: inserting a plurality of needles to a first depth in a subcutaneous area; providing RF energy to the first depth of the subcutaneous area through ends of the plurality of needles; terminating RF energy delivery to the first depth; locating the ends of the plurality of needles to a second depth in the subcutaneous area; and, providing RF energy to the second depth of the subcutaneous area through the ends of the plurality of needles.
地址 Gyeonggi-do KR