发明名称 |
TREATMENT APPARATUS USING HIGH FREQUENCY WAVES AND METHOD FOR CONTROLLING SAME |
摘要 |
The present invention relates to a treatment apparatus using high frequency waves, and to a method for controlling same. The treatment apparatus using high frequency waves comprises: a high frequency wave generating unit; a plurality of needles for providing, into the skin of a user, high frequency energy transferred from the high frequency wave generating unit; and a driving unit for inserting the plurality of needles into the skin of the user, wherein the apparatus further comprises a control unit for controlling the driving unit such that the plurality of needles are inserted into a first target point within the skin and then move to a second target point. |
申请公布号 |
US2016271410(A1) |
申请公布日期 |
2016.09.22 |
申请号 |
US201615167467 |
申请日期 |
2016.05.27 |
申请人 |
Lutronic Corporation |
发明人 |
Ko Kwang Chon |
分类号 |
A61N1/40;A61N1/32;A61H39/00;A61N1/06;A61B5/053;A61B5/00 |
主分类号 |
A61N1/40 |
代理机构 |
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代理人 |
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主权项 |
1. A treatment method using RF treatment apparatus, the treatment method comprising:
inserting a plurality of needles to a first depth in a subcutaneous area; providing RF energy to the first depth of the subcutaneous area through ends of the plurality of needles; terminating RF energy delivery to the first depth; locating the ends of the plurality of needles to a second depth in the subcutaneous area; and, providing RF energy to the second depth of the subcutaneous area through the ends of the plurality of needles. |
地址 |
Gyeonggi-do KR |