发明名称 |
Digital lithographic image forming surface incorporating a carbon black polymeric filler |
摘要 |
This disclosure is directed to a plate design for use in variable data digital lithographic image forming devices. The disclosed plate design incorporates surface passivated carbon black filler material particles in a fluorosilicone polymer. The disclosed functionalized carbon black material compositions include hydrophobic carbon black particles surface passivated via the use of an A/B-block copolymer where the A/B block contains a pentafluorostyrene-maleimide alternating polymer and the B block contains pure pentafluorostyrene. The A/B portion allows for the polymer to adsorb onto the carbon black while the b-block acts as the stabilizer in fluorinated systems. Fine dispersions result from the addition of poly (pentafluorostyrene/Maleimide-b-pentafluorostyrene) or P(PFS/MI-b-PFS) passivated carbon black to fluorinated polymers, enhancing the physical and mechanical properties. The disclosed surface passivated carbon black particles are particularly usable for improving operational characteristics of fluorosilocone-based reimageable surface layers of imaging members employed in the variable data digital lithographic image forming devices. |
申请公布号 |
US9469143(B1) |
申请公布日期 |
2016.10.18 |
申请号 |
US201514922124 |
申请日期 |
2015.10.24 |
申请人 |
Xerox Corporation |
发明人 |
Keoshkerian Barkev;Moorlag Carolyn |
分类号 |
B41C1/10;B41N1/14;C09D5/32;C09D7/12;C09D183/08;B41F7/02 |
主分类号 |
B41C1/10 |
代理机构 |
Prass LLP |
代理人 |
Prass, Jr. Ronald E.;Prass LLP |
主权项 |
1. An imaging member for an image forming device, comprising:
a structural mounting component; and an outer surface layer on the structural mounting component, comprising:
a silicone polymer substance; andinfra-red absorbing particulates dispersed in the silicone polymer substance, the infra-red absorbing particulates being functionalized by adsorbing a block copolymer on a surface of the infra-red absorbing particulates to passivate the infra-red absorbing particulates, said block copolymer comprising poly-(pentafluorostyrene/Maleimide-b-pentafluorostyrene) (P(PFS/MI-b-PFS)). |
地址 |
Norwalk CT US |