发明名称 Digital lithographic image forming surface incorporating a carbon black polymeric filler
摘要 This disclosure is directed to a plate design for use in variable data digital lithographic image forming devices. The disclosed plate design incorporates surface passivated carbon black filler material particles in a fluorosilicone polymer. The disclosed functionalized carbon black material compositions include hydrophobic carbon black particles surface passivated via the use of an A/B-block copolymer where the A/B block contains a pentafluorostyrene-maleimide alternating polymer and the B block contains pure pentafluorostyrene. The A/B portion allows for the polymer to adsorb onto the carbon black while the b-block acts as the stabilizer in fluorinated systems. Fine dispersions result from the addition of poly (pentafluorostyrene/Maleimide-b-pentafluorostyrene) or P(PFS/MI-b-PFS) passivated carbon black to fluorinated polymers, enhancing the physical and mechanical properties. The disclosed surface passivated carbon black particles are particularly usable for improving operational characteristics of fluorosilocone-based reimageable surface layers of imaging members employed in the variable data digital lithographic image forming devices.
申请公布号 US9469143(B1) 申请公布日期 2016.10.18
申请号 US201514922124 申请日期 2015.10.24
申请人 Xerox Corporation 发明人 Keoshkerian Barkev;Moorlag Carolyn
分类号 B41C1/10;B41N1/14;C09D5/32;C09D7/12;C09D183/08;B41F7/02 主分类号 B41C1/10
代理机构 Prass LLP 代理人 Prass, Jr. Ronald E.;Prass LLP
主权项 1. An imaging member for an image forming device, comprising: a structural mounting component; and an outer surface layer on the structural mounting component, comprising: a silicone polymer substance; andinfra-red absorbing particulates dispersed in the silicone polymer substance, the infra-red absorbing particulates being functionalized by adsorbing a block copolymer on a surface of the infra-red absorbing particulates to passivate the infra-red absorbing particulates, said block copolymer comprising poly-(pentafluorostyrene/Maleimide-b-pentafluorostyrene) (P(PFS/MI-b-PFS)).
地址 Norwalk CT US