发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To improve the degree of integration by providing independent floating wirings which are not connected anywhere and made of the same material as a gate material of transistors vertically disposed below a power wiring AL laid and connected in the horizontal direction of a basic gate array. SOLUTION: Independent floating wirings 21 which are not connected anywhere and made of the same material as a gate material of transistors are separately provided at p-type and n-type transistor regions forming basic gates, and signals existing inside a power potential feed AL1 wiring 5 and GND potential feed AL1 wiring 6 or signal transfer grids existing outside are used to enable the two-line transfer. P- and n-type transistors are separated in an SOG type basic gate array while floating wirings are provided separately for transistors whereby cells can be inverted upside down and disposed on a basic gate array 20c and the degree of integration can be improved.
申请公布号 JP2000040811(A) 申请公布日期 2000.02.08
申请号 JP19980208408 申请日期 1998.07.23
申请人 SEIKO EPSON CORP 发明人 ONO YOSHITERU
分类号 H01L21/8234;H01L21/82;H01L27/088;H01L27/118;(IPC1-7):H01L27/118;H01L21/823 主分类号 H01L21/8234
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