发明名称 SCANNING INTERFERENCE ELECTRON MICROSCOPE
摘要 PROBLEM TO BE SOLVED: To observe the direction of variation (increase and decrease) in conformity with the size of variation of a magnetic field by installing a mechanism for detecting deflection generating when an electron beam probe is passed through an observation region and a mechanism for detecting deflection difference between two electron beam probes in deflection. SOLUTION: An electron beam 2 is divided into two probe beams 4 with a biprism 3, and passed through an observation region 6. The probe beams 4 are inputted in a slit 10 through a deflection detection aperture 11 within a projection electron optical system 9, and intensity of the probe beams 4 passing through an opening of the slit 10 is detected with a detector 12, and a scanning image using a signal I1 as a brightness signal is formed with an image forming device 14 through a scanning control device 13 and a scanning deflector 8, and a contour image of the variation of the magnetic flux amount passing through between the probe beams 4 is obtained. In the image forming device 14, a scanning image using a signal I2 obtained by calculation of signals I0 and I1 as a brightness signal in addition to the signal I1 is formed, based on computation of a signal arithmetic unit 15, and an image of the direction in addition to an image of the variation of the magnetic field can be obtained.
申请公布号 JP2000048760(A) 申请公布日期 2000.02.18
申请号 JP19980213724 申请日期 1998.07.29
申请人 HITACHI LTD 发明人 YAJIMA YUSUKE;TAKAHASHI YOSHIO
分类号 G01R33/02;H01J37/04;H01J37/28;H01J37/295;(IPC1-7):H01J37/295 主分类号 G01R33/02
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