发明名称 PLASMA PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a device generating a plasma having an in-plane uniform density by propagating microwaves with the circular TM01 mode in a circular waveguide, and arranging a circular dielectric plate on the circular waveguide side of a microwave introducing window plate. SOLUTION: A circular waveguide 5 propagates microwaves with the circular TM01 mode. A window plate 6B is inserted into a microwave introducing window 6A, and a circular dielectric plate 8 with fixed thickness is installed directly above the window plate 6B. Magnetic field is formed by an exciting coil 11 in a plasma generation chamber 6, microwaves are introduced into the plasma generation chamber 6 through the window plate 6B, and plasma is generated via electron cyclotron resonance excitation. When the circular dielectric plate 8 is installed between the circular waveguide 5 and the microwave introducing window 6A of the plasma generation chamber 6, microwaves with uniform field intensity are introduced into the plasma generation chamber 6, and uniform plasma is generated.
申请公布号 JP2000058295(A) 申请公布日期 2000.02.25
申请号 JP19980239509 申请日期 1998.08.11
申请人 SUMITOMO METAL IND LTD 发明人 YANASE TOSHIHIRO
分类号 H05H1/46;(IPC1-7):H05H1/46 主分类号 H05H1/46
代理机构 代理人
主权项
地址