发明名称 METHOD AND DEVICE FOR HEAT TREATMENT
摘要 PROBLEM TO BE SOLVED: To dry a solution applied to an object from the inside by drying the solution by heating the object coated with the solution in a solvent atmosphere. SOLUTION: A glass substrate G coated with a resist film is carried in a heat treating device 22 in a state where a lid body 34 is raised and not put on a hot plate 31 and placed on the supporting pins 33 of the hot plate 31. Then the lid body 34 is lowered and put on the hot plate 31, resulting in formation of a heat treating space 35 between the hot plate 31 and the lid body 34. After the space 35 is formed, the hot plate 31 is heated with a heater 32 and, at the same time, a thinner gas is introduced to the space 35 from a gas inlet 36 while an exhaust port 41 is closed by a stop valve 44. Then the space 35 is exhausted through the exhaust port 41 by opening the stop valve 44 while the thinner gas is fed to the saturated heat-treating space 35 through the inlet port 36.
申请公布号 JP2000091224(A) 申请公布日期 2000.03.31
申请号 JP19980294737 申请日期 1998.09.09
申请人 TOKYO ELECTRON LTD 发明人 TATEYAMA KIYOHISA
分类号 G09F9/30;B05D1/32;B05D3/04;C03C17/00;F26B3/04;G02F1/1333;H01L21/027;(IPC1-7):H01L21/027;G02F1/133 主分类号 G09F9/30
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