| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum deposition device which is capable of continuously and uniformly forming a mixture film consisting of different elements on a surface of a traveling film and having a specified composition ratio and a target thickness. SOLUTION: A deposition device to form a mixture film consisting of different elements on a surface of a film 17 traveling in a vacuum tank, is provided with a holding means 9 to hold deposition materials of different kinds, a heating means 4 to form a mixture film on the surface of the film 17 by heating a material for deposition to deposit the material on the surface of the film 17, an X-ray irradiating means 7 to irradiate the X-ray on the mixture film on the film 17, a spectroscopic means 7c to achieve the spectroscopy of the characteristic X-ray excited by the X-ray irradiating means 7 into the characteristic X-ray intensity of each component by spectroscopic crystal plates as many as the components of the mixture film, and a measuring means to measure the intensity of the spectroscopic-characteristic X-ray by a proportional counter 7b and output the thickness data for each component of the mixture film.
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