| 摘要 |
This invention relates to inductive coil assemblies for plasma processing apparatus. The assembly includes a coil (10) and an external screen (12). The coil is constituted by a polarity of coil portions (13) and includes respective connecting means for connecting each portion (13) in parallel with the others and to RF source, the connecting means (14a, 14b) being formed such that current flowing in any part of the coil other than a portion is balanced by current flowing in an opposite sense in an adjacent part.
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