| 摘要 |
PROBLEM TO BE SOLVED: To reduce the generation of scratches in polishing by executing polishing after a specified time or more elapse after forming a protective layer when the surface of the protective layer is polished after a substrate, a magnetic layer and the protective layer are successively formed on a base. SOLUTION: The surface of a protective layer is polished after one hour or more, preferably two hours or more, elapse after forming the protective layer. Although the number of generation of scratches in polishing is reduced as a time after forming the protective layer, the degree of reduction is rapid at first, becomes slow in a short time and settles into a fixed value. Therefore, polishing is preferable after a state of the surface is stabilized by leaving the protective layer as it is for a long time as much as possible. However, from a viewpoint of production in a factory, the elapse of 1-5 hours, preferably 2-4 hours, from forming of the protective layer to polishing is set. And a lubricant is imparted to the protective layer after polishing to form a lubricant layer.
|
