| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing composition capable of achieving a higher quality surface using colloidal silica derived from an alkali silicate-containing solution.SOLUTION: There is provided a polishing composition which comprises colloidal silica derived from an alkali silicate-containing solution and a film-like substance adhesion inhibitor represented by the following formula (I). [(A-B)CH-SO]M(I) (wherein, A represents a hydrophobic group, B represents a divalent organic group having a carbonyl group, n is 1 or 2 and Mrepresents a monovalent cation.)SELECTED DRAWING: None |
