发明名称 VAPOR DEPOSITION MATERIAL HOLDING MEANS, AND VACUUM VAPOR DEPOSITION DEVICE
摘要 PROBLEM TO BE SOLVED: To continuously and uniformly form a mixed film which consists of different elements and having the specified composition ratio and target thickness on a film surface in a traveling condition by providing a container capable of maintaining different vapor deposition materials, and providing a thin partition part inside the container, and providing the cooling function capable of cooling the partition part. SOLUTION: A container is formed of a crucible 8, a partition part is formed of a plurality of copper sheet which are inclined approximately at the same angle as the angle of incidence of an electron beam irradiated on vapor deposition materials, and the cooling function is preferably provided from a refrigerant tube in contact with the partition part. The crucible 8 comprises a copper partition 13 to constitute the partition part and a copper outer frame 14, and a refrigerant pipe 15 in which cooling water is circulated is brought into contact with the partition 13. The refrigerant pipe 15 is connected to a circulation device and controllable at the specified temperature. The refrigerant pipe 15 is brought into contact with the copper partition 13 excellent in heat conductivity to effectively cool the partition 13.
申请公布号 JP2000212727(A) 申请公布日期 2000.08.02
申请号 JP19990016546 申请日期 1999.01.26
申请人 TOYOBO CO LTD 发明人 OSHIMA TSUKASA;KUBOTA TAKAHIRO;FUJITA HIROSHI;IZEKI SEIJI;HIDAKA HIDEJI;TAKADA MASUAKI
分类号 C08J5/18;C23C14/24;(IPC1-7):C23C14/24 主分类号 C08J5/18
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