| 摘要 |
PROBLEM TO BE SOLVED: To enable formation of a dummy pattern into a suitable shape so that it is contained in the edge of a wafer, to maintain uniform etching amount on the wafer side, and to prevent a resist peel off from the edge of a wafer, by obtaining an aligner which can transform exposure field into various shapes. SOLUTION: A blind drive portion consists of light shielding plate 37, a blind drive stage 38, and a blind drive stage 39. Each of the light shielding plate 37 are movable in the direction parallel/perpendicular to the edge and is rotatable. Each of the four shades are arranged counterposing each other, and each shade is controlled by a main control system via the blind drive unit. Four light shielding plates by moving in the direction parallel/perpendicular to the edge and by rotating determine the illuminating region and form an exposed field in various shapes and a dummy pattern.
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