| 摘要 |
PURPOSE: Provided is a positive-type resist coating composition for use in ultrafine processing, which permits stable fine processing, has excellent storage stability, gives an excellent form of a pattern, and maintains excellent resist sensitivity after a long time. CONSTITUTION: The positive-type resist coating composition comprises: (a) an alkali-insoluble or hardly soluble resin having at least one acid-decomposable group selected from the group consisting of a substituted methyl group, a 1-substituted ethyl group, a silyl group, a germyl group, an alkoxycarbonyl group and an acyl group, the resin being alkali-soluble when the above group is acid-decomposed; (b) at least one radiation-sensitive acid-generating agent selected from the group consisting of an onium salt compound, a halogen-containing compound, a sulfone compound, a nitrobenzyl compound and a sulfonate compound, and (c) at least one solvent selected from methyl 3-methoxypropionate and ethyl 3-ethoxypropionate. |
