发明名称 ION GENERATION METHOD AND ION SOURCE
摘要 PROBLEM TO BE SOLVED: To provide an ion source capable of restraining impurities from jumping out of an extraction electrode part. SOLUTION: A feeding port 3 for a discharging gas G is formed in an one-end side wall body part 2a of a cylindrical body 2, an electron generation chamber 6 for generating electrons are formed by arranging an electron emission part on one-end side inside the cylindrical body 2, a plasma generation chamber 7 for plasma generation communicating with the electron generation chamber 6 is formed from the central part inside the cylindrical body 2 toward the other end side, an ion extraction port 8 is formed in a side wall body part 2b on the other side of the cylindrical body 2, a first and second permanent magnets 11A, 11B for ion repulsion and for ion discharge and a third permanent magnet 12 are arranged around the plasma generation chamber 7 in the cylindrical body 2, a fourth permanent magnet 13 having an intensity of 5000 gausses is arranged in the circumference of the extraction port 8, and two extraction electrodes 21, 22 having ion passing hole parts 21a, 22a are arranged side by side to provide an acceleration voltage.
申请公布号 JP2000294157(A) 申请公布日期 2000.10.20
申请号 JP19990101904 申请日期 1999.04.09
申请人 TAKAHASHI KEN;HITACHI ZOSEN CORP 发明人 TAKAHASHI KEN;OKANIWA OSAMU;KOMURA AKIO
分类号 H01J27/14;H01J37/08;(IPC1-7):H01J27/14 主分类号 H01J27/14
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