发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURE
摘要 PROBLEM TO BE SOLVED: To make it possible to form a high-frequency transistor having small parasitic collector resistance and a highly dielectric transistor on the same substrate even if the substrate has a thick epitaxial layer. SOLUTION: A second reverse-conductivity buried collector layer 22 is formed which is raised up from a first reverse-conductivity buried collector layer 21. A reverse-conductivity pedestal collector layer 102 and a first conductivity base layer 8 are formed at the position contacting the second reverse- conductivity buried collector layer 22. This can prevent a Kirk effect to thereby increase the film thickness of an epitaxial collector layer.
申请公布号 JP2000323489(A) 申请公布日期 2000.11.24
申请号 JP19990132431 申请日期 1999.05.13
申请人 MATSUSHITA ELECTRONICS INDUSTRY CORP 发明人 KURIYAMA HITOSHI;KAJIYAMA MASAOKI;SAWADA SHIGEKI
分类号 H01L29/73;H01L21/331;H01L29/732;(IPC1-7):H01L21/331 主分类号 H01L29/73
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