发明名称 |
SEMICONDUCTOR DEVICE AND ITS MANUFACTURE |
摘要 |
PROBLEM TO BE SOLVED: To make it possible to form a high-frequency transistor having small parasitic collector resistance and a highly dielectric transistor on the same substrate even if the substrate has a thick epitaxial layer. SOLUTION: A second reverse-conductivity buried collector layer 22 is formed which is raised up from a first reverse-conductivity buried collector layer 21. A reverse-conductivity pedestal collector layer 102 and a first conductivity base layer 8 are formed at the position contacting the second reverse- conductivity buried collector layer 22. This can prevent a Kirk effect to thereby increase the film thickness of an epitaxial collector layer.
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申请公布号 |
JP2000323489(A) |
申请公布日期 |
2000.11.24 |
申请号 |
JP19990132431 |
申请日期 |
1999.05.13 |
申请人 |
MATSUSHITA ELECTRONICS INDUSTRY CORP |
发明人 |
KURIYAMA HITOSHI;KAJIYAMA MASAOKI;SAWADA SHIGEKI |
分类号 |
H01L29/73;H01L21/331;H01L29/732;(IPC1-7):H01L21/331 |
主分类号 |
H01L29/73 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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