发明名称 Verfahren zur Herstellung einer Elektrode
摘要 The invention relates to a method for producing an electrode (10) in which the electrode material (9), which frequently can only be etched with difficulty, no longer needs to be directly structured. The desired structure is firstly produced in the insulation layer (5) which can be easily etched and thus be easily structured, and is then filled in with the electrode material (9). This makes it possible to avoid a direct etching of the electrode material which exhibits all the cited problems.
申请公布号 DE19929723(A1) 申请公布日期 2001.01.04
申请号 DE19991029723 申请日期 1999.06.29
申请人 SIEMENS AG 发明人 BRAUN, GEORG;HOENIGSCHMID, HEINZ;BEITEL, GERHARD;WENDT, HERMANN;SAENGER, ANNETTE
分类号 H01L21/02;H01L21/8242;(IPC1-7):H01L21/824;H01L21/28 主分类号 H01L21/02
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