发明名称 LOW-OUTGASSING VINYL ESTER-BASED COATING MATERIAL
摘要 PROBLEM TO BE SOLVED: To obtain the subject coating material usable in constructional members for a building such as a clean room for producing highly integrated semiconductor devices. SOLUTION: This coating material comprises a base composed mainly of low-volatile vinyl ester resin (epoxyacrylate) and a curing agent with an organic peroxide diluted with a low-volatile component; wherein 90-95 wt.% of a reactive diluent contained in the vinyl ester resin base is an acrylic monomer and the diluent contained in the curing agent is dibutyl fumarate reactive with the vinyl group in the base. Furthermore, in the coating material, it is preferable to use mainly an organic acid cobalt salt as an accelerator.
申请公布号 JP2001002976(A) 申请公布日期 2001.01.09
申请号 JP19990171617 申请日期 1999.06.17
申请人 SHIMIZU CORP;ABC TRADING CO LTD 发明人 TANAKA ISAO;KAJIMA TOMOAKI;SUZUKI YOSHINOBU;ITO HIROMOTO
分类号 C08F290/06;C09D4/06;C09D131/00;C09D163/10;(IPC1-7):C09D131/00 主分类号 C08F290/06
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