发明名称 VAPOR DEPOSITION EQUIPMENT HAVING CO-AXIAL VACUUM ARC VAPOR DEPOSITION SOURCE
摘要 PROBLEM TO BE SOLVED: To provide a co-axial vacuum arc vapor deposition source capable of forming a thin film of high quality. SOLUTION: A cylindrical magnet 31 is disposed on the outside periphery of an anode 30 of a co-axial vacuum arc vapor deposition source 5. Electrons leaked through the opening of the anode 30 wind around the lines of magnetic force formed by the magnet 31 to form electron clouds. Because the fine particles of a vapor deposition material have positive charges, they are attracted to the electron clouds and reach, in a state collected by the lines of magnetic force, the surface of a substrate 22 to grow a thin film. No coarse particles are collected and mixed into the thin film because of their large mass as compared with their electric charge.
申请公布号 JP2001011606(A) 申请公布日期 2001.01.16
申请号 JP19990177590 申请日期 1999.06.24
申请人 ULVAC JAPAN LTD 发明人 AGAWA YOSHIAKI;YAMAMOTO YOSHIHIRO
分类号 H01L21/203;C23C14/24;(IPC1-7):C23C14/24 主分类号 H01L21/203
代理机构 代理人
主权项
地址
您可能感兴趣的专利