发明名称 PLATING METHOD FOR NONCONDUCTOR
摘要 PROBLEM TO BE SOLVED: To provide a plating method for a nonconductor capable of forming a metallic layer on the predetermined face to be plated in a nonconductor without using an electroless plating bath and moreover capable of easily and economically forming a stable plating layer. SOLUTION: A primer coating material contg. a catalyst for electroless plating is applied on the predetermined face to be plated in a nonconductor, drying is executed to form a catalyst-contg. primer coating film, thereafter, a soln. of metallic salt contg. silver, copper or nickel as metallic ions and a soln. of a reducing agent contg. a reducing agent therefor are sprayed from separate spray nozzles to the primer coating film to form a metallic layer capable of electroplating, and then, an electroplating layer is formed on the metallic layer by electroplating treatment.
申请公布号 JP2001011643(A) 申请公布日期 2001.01.16
申请号 JP19990180380 申请日期 1999.06.25
申请人 INOAC CORP 发明人 YAMAMOTO TOSHIHIRO
分类号 C23C18/20;C23C18/28;C25D5/54;(IPC1-7):C23C18/20 主分类号 C23C18/20
代理机构 代理人
主权项
地址