| 摘要 |
PURPOSE: An apparatus for treating aqueous waste gas is provided which treats the aqueous waste gas by spraying an aqueous solution into the aqueous waste gas that is not participated in the semiconductor processes in a showering method after proceeding semiconductor processes by process facility. CONSTITUTION: The apparatus(500) for treating aqueous waste gas comprises an aqueous waste gas treatment unit(100) at which at least one or more aqueous solution spray nozzles are formed, and which converts the aqueous waste gas into a refined gas by spraying an aqueous solution into the aqueous waste gas in a showering method after receiving the aqueous waste gas from a process facility using an aqueous chemical gas; a drain unit(200) discharging the stored aqueous solution into the outside after storing the collected aqueous solution by collecting the aqueous solution through a main pipe connected to the aqueous waste gas treatment unit(100); an aqueous vaporization unit(300) which is connected to the main pipe so that the refined gas can be flown into, and which vaporizes the aqueous solution contained in the gas; a cooling unit(400) which is connected to the aqueous vaporization unit(300) so as to cool and discharge the aqueous solution vaporized in the aqueous vaporization unit(300); and blowers(40,80) which adjust the pressure so that a pressure is constantly maintained in the process facility, and which are selectively installed so that an entrance of the aqueous waste gas treatment unit(100) is connected to an exit of the cooling unit(400), thereby controlling an internal pressure inside the process facility.
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