发明名称 |
EQUIPEMENT ET PROCEDE DE FABRICATION DE COMPOSANTS OPTIQUES |
摘要 |
The invention concerns a method and equipment for making optical components by irradiating a dielectric substrate (8) coated with a conductive layer (10) by vapour deposition, the irradiation being carried out by means of a beam of deflected electrons for deflector coils (4 to 6) to form a structured modification of refractive index. The invention is characterised in that the dielectric substrate is formed with doped silica.
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申请公布号 |
FR2798222(A1) |
申请公布日期 |
2001.03.09 |
申请号 |
FR19990011189 |
申请日期 |
1999.09.07 |
申请人 |
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE CNRS |
发明人 |
POUMELLEC BERNARD;KHERBOUCHE FARID;CHARPENTIER FRANCOIS |
分类号 |
C03C23/00;G02B6/13;(IPC1-7):H01L21/263;H01L21/322 |
主分类号 |
C03C23/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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