发明名称 EQUIPEMENT ET PROCEDE DE FABRICATION DE COMPOSANTS OPTIQUES
摘要 The invention concerns a method and equipment for making optical components by irradiating a dielectric substrate (8) coated with a conductive layer (10) by vapour deposition, the irradiation being carried out by means of a beam of deflected electrons for deflector coils (4 to 6) to form a structured modification of refractive index. The invention is characterised in that the dielectric substrate is formed with doped silica.
申请公布号 FR2798222(A1) 申请公布日期 2001.03.09
申请号 FR19990011189 申请日期 1999.09.07
申请人 CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE CNRS 发明人 POUMELLEC BERNARD;KHERBOUCHE FARID;CHARPENTIER FRANCOIS
分类号 C03C23/00;G02B6/13;(IPC1-7):H01L21/263;H01L21/322 主分类号 C03C23/00
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