Method of detecting and preventing regions critical for etching, e.g. for screen printing plate manufacture

摘要

The method involves accessing data structures of a layout, accessing data structures of configuration elements (A-C) in a plane of the layout, detecting critical regions (X,Y,Z,K1,K2) between the configuration elements according to programme procedures, altering the regions and displaying them. Alterations are performed to prevent under etching and the altered regions are integrated into the existing data structure for the layout.