METHOD OF MANUFACTURING CRYSTALLINE SEMICONDUCTOR FILM, CRYSTALLIZING APPARATUS AND METHOD OF MANUFACTURING TFT

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a crystalline semiconductor film and a crystallizing apparatus used in the manufacturing method, whereby the crystalline semiconductor film composed of crystals having large grain sizes can be formed comparatively easily and a TFT superior in TR characteristics can be manufactured. SOLUTION: A laser beam of a first energy E1 which is sufficient to form crystals having large grain sizes is irradiated on a glass substrate 15 having an amorphous Si film, thereby forming large crystals and growing fine crystals, and a laser beam of a second energy E2 is irradiated on it, which is lower than E1 but is sufficient to melt and recrystallize the fine crystals.