发明名称 METHOD OF CLEANING CONDUCTIVE SUBSTRATE AND METHOD OF PRODUCING ELECTROPHOTOGRAPHIC PHOTORECEPTOR
摘要 PROBLEM TO BE SOLVED: To provide a method of cleaning a conductive substrate by which the surface of a conductive substrate is not damaged but contamination on the surface of the conductive substrate can be easily and surely removed without carrying out a complicated process such as precision cleaning by ultrasonic waves, the deposited foreign matter is easily removed and secondary contamination by cleaning is not caused, and to provide a method of producing an electrophotographic photoreceptor having excellent image quality by which the surface of a conductive substrate is not damaged but contamination on the surface of the conductive substrate can be easily and surely removed without carrying out a complicated process such as precision cleaning by ultrasonic waves, the deposited foreign matter is easily removed, secondary contamination by cleaning is not caused, and image defects such as black spots and fog are not produced. SOLUTION: In the method of cleaning a conductive substrate by cleaning the surface of a conductive substrate by using a cleaning liquid containing a fluorine-based solvent, and in the method of producing an electrophotographic photoreceptor by forming a photosensitive layer on the conductive substrate, the surface of the conductive substrate is cleaned by using a cleaning liquid containing a fluorine-based solvent before the photosensitive layer is formed.
申请公布号 JP2001154376(A) 申请公布日期 2001.06.08
申请号 JP19990337892 申请日期 1999.11.29
申请人 HITACHI CHEM CO LTD 发明人 KANEKO SUSUMU;MIYAOKA SEIJI;OCHIAI TAKAO;HANADA KAZUHIRO
分类号 G03G5/00;(IPC1-7):G03G5/00 主分类号 G03G5/00
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