发明名称 SUBSTRATE SUPPORTING MECHANISM AND SUBSTRATE SUPPORTING /ROTATING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate supporting/rotating device and a substrate supporting mechanism capable of receiving a substrate without moving a transported substrate holder and rotating the substrate on the spot. SOLUTION: The device is composed of a hollow columnar member, a central shaft which is attached to the hollow part by being energized toward one side in the axial direction by a first spring and at one end part of which a taper part is formed, and a radial direction moving member in which pawls supporting the inner peripheral end surface of the substrate are provided in the outer peripheral side of plural moving members moving in the radial direction provided in one end surface of the columnar member and which is energized in the central axis direction by a second spring 2. The substrate supporting mechanism supports and releases the substrate by converting the movement in the axial direction of the central shaft into the movement in the radial direction of the radial direction moving member is used, and further the mechanism which moves the substrate supporting mechanism in the axial direction and rotates the same and a mechanism which moves the central shaft in the axial direction are provided.
申请公布号 JP2001216689(A) 申请公布日期 2001.08.10
申请号 JP20000022437 申请日期 2000.01.31
申请人 ANELVA CORP 发明人 NOZAWA NAOYUKI;TAKEYAMA TERUSHIGE;SAKAI MIHO
分类号 C23C14/50;C23C14/56;C23C16/44;G11B5/84;G11B7/26;G11B11/105;G11B17/028;H01L21/683;(IPC1-7):G11B7/26;H01L21/68 主分类号 C23C14/50
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