| 摘要 |
PROBLEM TO BE SOLVED: To provide plasma treatment equipment wherein plasma treatment in a region corresponding to a pin hole for a lifter pin and a peripheral region of the above region becomes almost uniform in the case that base substance of an object is dielectrics. SOLUTION: Plasma treatment equipment 10 is provided with a hermetic sealed vessel 20, a lower electrode 50 arranged in the hermetic vessel 20 with a member 90 mounted, an upper electrode 40 which faces the lower electrode 50 in the hermetic vessel 20, and a lifter pin 60 to penetrate a through hole 52 arranged on the lower electrode 50 and formed so as to be able to push up the member 90 from the lower electrode 50. The lifter pin 60 is formed of conductive material, at the same potential as the lower electrode, and made to abut against the member 90 mounted on the lower electrode 50 with elasticity by function of an elastic member at least while a plasma is generated. The lifter pin 60 has a covering part formed of material softer than its tip region to cover the tip region.
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