发明名称 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND FABRICATION METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile semiconductor memory device which controls variance of threshold values in a floating gate and prevents deterioration in reliability of retaining data. SOLUTION: In a NOR type nonvolatile semiconductor memory device 30, a plurality of nonvolatile semiconductor element cells 40 are arrayed on a substrate 1 through element isolating regions 50 composed of trench part 5. In each element cell 40, side wall edges 31 of a first floating gate 3 which are formed on the substrate 1 through an oxide film 2 is isolated from an edge 21 of the trench part 5.
申请公布号 JP2001308208(A) 申请公布日期 2001.11.02
申请号 JP20000124843 申请日期 2000.04.25
申请人 NEC CORP 发明人 INOUE TATSURO
分类号 H01L21/8247;H01L27/115;H01L29/423;H01L29/788;H01L29/792;(IPC1-7):H01L21/824 主分类号 H01L21/8247
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