Improved method and apparatus for image formation

摘要

The present invention relates to a method for adjusting a pattern to be imaged onto a workpiece. The pattern representing an image is divided in a plurality of regions. A pattern density in said plurality of region is computed. At least one feature in at least one of said plurality of regions is adjusted based on the pattern density in at least one other region. An adjusted pattern is fed to a modulator. The image is created on said workpiece by using said corrected pattern. The invention also relates to an apparatus for imaging adjusted pattern on a workpiece, a semiconducting wafer to be imaged with an adjusted pattern and a mask or a reticle to be imaged with an adjusted pattern.