Apparatus and method of correcting layout pattern data, method of manufacturing semiconductor devices and recording medium

摘要

The invention provides an apparatus and a method of correcting layout pattern. The apparatus has a deletion region side extracting section for extracting sides of a region to be deleted having a predetermined shape such as protrusion, notch or step in a layout pattern of a circuit, a deletion-use pattern generator for generating a deletion-use pattern based on the extracted sides, and an operating section for executing a predetermined operation to the layout pattern with the deletion-use pattern so as to remove the region to be deleted from the original layout pattern.