PROJECTION ALIGNER, EXPOSURE METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR, AND METHOD FOR ADJUSTING PROJECTION OPTICAL SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a high-performance projection exposure device which is excellent in durability and reproducibility while allowing adjustment of optical characteristics of a projection optical system which is rotational asymmetry around an optical axis and remains in the projection optical system. SOLUTION: There are provided a process for adjusting optical characteristics of a projection optical system 36, a process for lighting a reticle 35 using a lighting optical system, and a process for projecting a pattern image of the reticle onto a board 38 using the projection optical system. The adjustment process comprises a process where, provided between the reticle and the board, a first optical means having a power of rotation asymmetry about the projection optical system is used to correct the optical characteristics of rotation asymmetry around the optical axis of the projection optical system remaining in the projection optical system, and a process which prevents degradation of matching precision caused by expansion/contraction of the board.