| 发明名称 |
OXIDIZED SHOWERHEAD AND PROCESS KIT PARTS AND METHODS OF USING SAME |
| 摘要 |
Methods and apparatus for processing a substrate are provided herein. In some embodiments, a process chamber includes: a chamber body and a lid assembly defining a processing volume within the process chamber; a substrate support disposed within the processing volume to support a substrate; and a showerhead having a first surface including a plurality of gas distribution holes disposed opposite and parallel to the substrate support, wherein the showerhead is fabricated from aluminum and includes an aluminum oxide coating along the first surface, wherein the aluminum oxide coating has a thickness of about 0.0001 to about 0.002 inches. In some embodiments, the showerhead may further have at least one of a roughness of about 10 to about 300μ-in Ra, or an emissivity (ε) of about 0.20 to about 0.80. The process chamber may be a thermal atomic layer deposition (ALD) chamber. |
| 申请公布号 |
US2016319428(A1) |
申请公布日期 |
2016.11.03 |
| 申请号 |
US201514750322 |
申请日期 |
2015.06.25 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
RASHEED Muhammad M.;RAMACHANDRAN Balasubramanian;CHEN Shih Chung;PAPKE Kevin A.;ZHOU Lei;ZHOU Jing |
| 分类号 |
C23C16/455;C23C16/458 |
主分类号 |
C23C16/455 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A process chamber, comprising:
a chamber body and a lid assembly defining a processing volume within the process chamber; a substrate support disposed within the processing volume to support a substrate; and a showerhead having a first surface including a plurality of gas distribution holes disposed opposite and parallel to the substrate support, wherein the showerhead is fabricated from aluminum and includes an aluminum oxide coating along the first surface, wherein the aluminum oxide coating has a thickness of about 0.0001 to about 0.002 inches. |
| 地址 |
Santa Clara CA US |
