发明名称 LOW-CAPACITANCE BONDING PAD FOR SEMICONDUCTOR DEVICE
摘要 A low-capacitance bonding pad for a semiconductor device. A diffusion region is formed in a substrate, and a bonding pad is formed on the substrate and aligned with the diffusion region. The bonding pad is made from a stacked metal layer and a metal layer. The stacked metal layer is made from a plurality of metal layers and a plurality of dielectric layers, and the metal layers and the dielectric layers are stacked alternately. The metal layers stacked in the stacked metal layer are formed with small areas. Each of the metal layers stacked in the stacked metal layer is coupled with the adjacent metal layer by via plugs.
申请公布号 US2002017672(A1) 申请公布日期 2002.02.14
申请号 US19990329648 申请日期 1999.06.09
申请人 KER MING-DOU;JIANG HSIN-CHIN 发明人 KER MING-DOU;JIANG HSIN-CHIN
分类号 H01L23/485;H01L23/522;(IPC1-7):H01L27/108;H01L29/76;H01L29/94;H01L31/119;H01L23/48;H01L23/52;H01L29/40 主分类号 H01L23/485
代理机构 代理人
主权项
地址