发明名称 ILLUMINATION OPTICAL SYSTEM, ILLUMINATION METHOD, EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an illumination optical system capable of achieving uniform integrated illuminance distribution on an illumination target surface by use of a relatively smaller number of light pulses even when a high-coherence light source is used.SOLUTION: The illumination optical system illuminates an illumination target surface with a plurality of number of light pulses from a light source. The illumination optical system includes: a formation optical system for forming a first illuminance distribution 41a in an illumination target surface on an object, in which the intensity of light varies in a predetermined direction by use of first light pulses in the plurality of light pulses, as well as for forming a second illuminance distribution 41b in the illumination target surface, in which the intensity of light varies in a predetermined direction by use of second light pulses in the plurality of light pulses; and a relative position changing part for changing relative positions in the predetermined direction of at least a part of the first illuminance distribution 41a and of at least a part of the second illuminance distribution 41b with respect to the object.SELECTED DRAWING: Figure 7
申请公布号 JP2016188953(A) 申请公布日期 2016.11.04
申请号 JP20150069068 申请日期 2015.03.30
申请人 NIKON CORP 发明人 OKUHIRA YOSUKE
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
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