METHOD FOR FORMING HIGH-QUALITY THIN FILM USING ULTRASONIC WAVES

摘要

PURPOSE: A method for forming a high-quality thin film using ultrasonic waves is provided to increase the efficiency of forming a thin film and to improve the quality of the thin film, by applying ultrasonic waves to a target material or to the target material and an evaporation source while the thin film is formed. CONSTITUTION: The evaporation source(12) in a chamber(15) is deposited to form the thin film on the target material(11). The particles of the evaporation source are deposited on the target material while ultrasonic waves are applied to the target material or to the target material and the evaporation source. An ultrasonic wave generation unit(13) is attached to the target material to apply ultrasonic waves.