| 发明名称 |
ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY |
| 摘要 |
The invention concerns an illumination system, particularly for microlithography with wavelengths </= 193 nm, comprising: a primary light; a first optical component; a second optical; an image plane component; and an exit pupil; wherein said first optical component transforms said primary light source into a plurality of secondary light sources that are imaged by said second optical component in said exit pupil; wherein said first optical component includes a first optical element having a plurality of first raster elements, that are imaged into said image plane producing a plurality of images being superimposed at least partially on a field in said image plane, wherein said plurality of first raster elements have negative optical power. |
| 申请公布号 |
WO0227402(A2) |
申请公布日期 |
2002.04.04 |
| 申请号 |
WO2001EP11273 |
申请日期 |
2001.09.28 |
| 申请人 |
CARL ZEISS;CARL-ZEISS-STIFTUNG TRADING AS CARL ZEISS;ANTONI, MARTIN;SINGER, WOLFGANG;WANGLER, JOHANNES |
发明人 |
ANTONI, MARTIN;SINGER, WOLFGANG;WANGLER, JOHANNES |
| 分类号 |
F21V5/00;F21V7/00;F21V13/04;G02B13/18;G02B17/00;G02B17/08;G02B19/00;G03F7/20;G21K1/06;G21K5/00;G21K5/02;G21K5/04;H01L21/027 |
主分类号 |
F21V5/00 |
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