| 摘要 |
A system and method for providing substantially defect free rapid thermal processing. The present invention includes a wafer processing system used to process semiconductor wafers into electronic devices. In accordance with the present invention, once the wafer is processed, a shield can be inserted into the reactor to a position between the reactor heating surface and the wafer. The shield causes the temperature of the wafer to be reduced. Once the temperature of the wafer has been reduced to below a predetermined critical temperature, the robot picks up the wafer and removes the wafer from the processing chamber. |
