| 发明名称 |
Optical member for photolithography and photolithography apparatus |
| 摘要 |
An optical member for photolithography made of a calcium fluoride crystal exhibits an internal transmittance of 99.5%/cm or greater with respect to light having a specific wavelength of 185 nm or shorter.
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| 申请公布号 |
US6377332(B1) |
申请公布日期 |
2002.04.23 |
| 申请号 |
US20000494039 |
申请日期 |
2000.01.31 |
| 申请人 |
NIKON CORPORATION |
发明人 |
SAKUMA SHIGERU;SHIOZAWA MASAKI |
| 分类号 |
G03F7/20;(IPC1-7):G03B27/42;G03B27/54;G02B13/14;F21V9/06 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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