| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma washing device for resolving problems which arise when vacuum breaking gas is introduced into a chamber. SOLUTION: A plasma washing device has chambers 2A, 2B, an evacuation means 5 for evacuating a chamber, a plasma reaction gas supply means 25 for supplying plasma reaction gas into a chamber, a washing object supporting means 28 for supporting a washing object inside a chamber, a pair of electrodes 9, 10 arranged to hold a washing object between supported by the washing object supporting means, a high frequency voltage applying means 3 for applying a high frequency voltage between electrodes and a vacuum breaking gas supply means 26 for supplying vacuum breaking gas of a prescribed flow rate into a chamber. In the device, after washing treatment, when vacuum breaking gas is supplied into a chamber, at first vacuum breaking gas of a flow rate, which is lower than a prescribed flow rate, is supplied, and after passage of a prescribed time, vacuum breaking gas of a prescribed flow rate is supplied.
|
