发明名称 |
Method for purifying semiconductor gases |
摘要 |
This invention is directed a method for purifying an impure gas to produce an ultra-high purity gas comprising the steps of a) passing the impure liquefied gas through a first absorption means to remove impurities from the liquid phase therein to produce a first purified fluid; b) passing the first purified fluid through an evaporation means to remove impurities therein to produce a second purified gas; and c) passing the second purified gas through a second absorption means to remove purities from the vapor phase therein to produce the ultra-high purity gas.
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申请公布号 |
US2002074289(A1) |
申请公布日期 |
2002.06.20 |
申请号 |
US20000735802 |
申请日期 |
2000.12.14 |
申请人 |
SATERIA SALIM;HOLMER ARTHUR EDWARD;SHREWSBURY RONALD WILLIAM |
发明人 |
SATERIA SALIM;HOLMER ARTHUR EDWARD;SHREWSBURY RONALD WILLIAM |
分类号 |
B01D15/00;B01D53/26;B01D53/28;C01B21/04;C01B23/00;C01C1/02;F25J3/06;F25J3/08;(IPC1-7):B01D15/00 |
主分类号 |
B01D15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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