发明名称 |
Susceptorless reactor for growing epitaxial layers on wafers by chemical vapor deposition |
摘要 |
The invention describes a CVD reactor on solid substrates and a related method of deposition of epitaxial layers on the wafers. In the reactor of the invention, the wafer carrier is transported between a loading position and a deposition position. In the deposition position, the wafer carrier is detachably mounted on an upper end of a rotatable spindle without an intermediate susceptor. The reactor of the invention may process a single wafer or a plurality of wafers at the same time. The invention also described several embodiments and variants of the invention. One of the variants of the invention provides a decrease in a heat drain from the wafer-supporting assembly through the spindle and a novel heating arrangement therefore. The advantages of the invention include lower reactor cycle, the lower cost and longer lifetime of the component parts, and better temperature control, among others.
|
申请公布号 |
US2002106826(A1) |
申请公布日期 |
2002.08.08 |
申请号 |
US20010778265 |
申请日期 |
2001.02.07 |
申请人 |
BOGUSLAVSKIY VADIM;GURARY ALEXANDER |
发明人 |
BOGUSLAVSKIY VADIM;GURARY ALEXANDER |
分类号 |
C30B15/12;C23C16/44;C23C16/458;C23C16/46;C30B25/12;H01L21/205;H01L21/687;(IPC1-7):A63D15/08 |
主分类号 |
C30B15/12 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|