发明名称 VERTICAL OVEN AND METHOD OF PROCESSING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To enable a wafer as a processing object introduced in a vertical oven to be improved in the uniformity of a time integral value of temperature through its surface. SOLUTION: A boat loaded with wafers is introduced into a cylindrical oven, and the boat is so positioned as to make its rotation axis located away from the center axis of the cylindrical oven by a certain distance larger than the radius of the wafer and is rotated. The boat is not only rotated but is also revolved. Furthermore, the boat is moved vertically during processing.
申请公布号 JP2002231635(A) 申请公布日期 2002.08.16
申请号 JP20010021783 申请日期 2001.01.30
申请人 SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC 发明人 NAKAGAWA YOSHIKAZU
分类号 F27D3/12;F27B5/06;H01L21/205;H01L21/22;H01L21/324;(IPC1-7):H01L21/205 主分类号 F27D3/12
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