发明名称 |
VERTICAL OVEN AND METHOD OF PROCESSING SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To enable a wafer as a processing object introduced in a vertical oven to be improved in the uniformity of a time integral value of temperature through its surface. SOLUTION: A boat loaded with wafers is introduced into a cylindrical oven, and the boat is so positioned as to make its rotation axis located away from the center axis of the cylindrical oven by a certain distance larger than the radius of the wafer and is rotated. The boat is not only rotated but is also revolved. Furthermore, the boat is moved vertically during processing.
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申请公布号 |
JP2002231635(A) |
申请公布日期 |
2002.08.16 |
申请号 |
JP20010021783 |
申请日期 |
2001.01.30 |
申请人 |
SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC |
发明人 |
NAKAGAWA YOSHIKAZU |
分类号 |
F27D3/12;F27B5/06;H01L21/205;H01L21/22;H01L21/324;(IPC1-7):H01L21/205 |
主分类号 |
F27D3/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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