发明名称 |
SUBSTRATE-PROCESSING APPARATUS, SUBSTRATE-PROCESSING SYSTEM, AND SUBSTRATE TRANSFER METHOD |
摘要 |
PURPOSE: To minimize damages to peripheral members even when a wafer carrier falls down during movement or lifting/lowering operations of the wafer carrier on a substrate-processing apparatus. CONSTITUTION: A substrate-processing apparatus for performing prescribed processing operation over a wafer transferred from a load port door includes a load port base 2a for mounting thereon a wafer carrier, accommodating a plurality of wafers in front of the load port door and a shielding plate provided, so as to surround the periphery of the load port base 2a.
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申请公布号 |
KR20020072224(A) |
申请公布日期 |
2002.09.14 |
申请号 |
KR20020012370 |
申请日期 |
2002.03.08 |
申请人 |
SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. |
发明人 |
KIM, SOEK HYUN;KIMOTO SHINYO;MUGURUMA TERUMI;NISHI MASAHIRO;TOKUNAGA KENJI;WATANABE SHINICHI;YAMADA YOSHIAKI |
分类号 |
B65G49/07;H01L21/673;H01L21/677;(IPC1-7):H01L21/68 |
主分类号 |
B65G49/07 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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