发明名称 SUBSTRATE-PROCESSING APPARATUS, SUBSTRATE-PROCESSING SYSTEM, AND SUBSTRATE TRANSFER METHOD
摘要 PURPOSE: To minimize damages to peripheral members even when a wafer carrier falls down during movement or lifting/lowering operations of the wafer carrier on a substrate-processing apparatus. CONSTITUTION: A substrate-processing apparatus for performing prescribed processing operation over a wafer transferred from a load port door includes a load port base 2a for mounting thereon a wafer carrier, accommodating a plurality of wafers in front of the load port door and a shielding plate provided, so as to surround the periphery of the load port base 2a.
申请公布号 KR20020072224(A) 申请公布日期 2002.09.14
申请号 KR20020012370 申请日期 2002.03.08
申请人 SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. 发明人 KIM, SOEK HYUN;KIMOTO SHINYO;MUGURUMA TERUMI;NISHI MASAHIRO;TOKUNAGA KENJI;WATANABE SHINICHI;YAMADA YOSHIAKI
分类号 B65G49/07;H01L21/673;H01L21/677;(IPC1-7):H01L21/68 主分类号 B65G49/07
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