发明名称 HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material having sufficiently high sensitivity and maximum density and excellent in raw stock preservability. SOLUTION: In the heat developable photosensitive material having at least one photosensitive layer containing photosensitive silver halide, a non- photosensitive organic silver salt and a binder on the base, at least one compound of formula (1) is contained in the photosensitive layer and/or an adjacent layer. In the formula (1), R is H, alkyl, aralkyl, alkoxy, alkyl or aryl substituted amino, amido, sulfonamido, ureido, urethane, aryloxy, sulfamoyl, carbamoyl, aryl, alkylthio, arylthio, hydroxy, alkylcarbonyl, halogen, cyano or phosphoric acid amido.
申请公布号 JP2002303954(A) 申请公布日期 2002.10.18
申请号 JP20010104213 申请日期 2001.04.03
申请人 FUJI PHOTO FILM CO LTD 发明人 YAMAMOTO SEIICHI
分类号 G03C1/498;(IPC1-7):G03C1/498 主分类号 G03C1/498
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