发明名称 Trench MOSFET with structure having low gate charge
摘要 A trench MOSFET includes a plurality of trench segments in an upper surface of an epitaxial layer, extending through a second conductivity type region into a first conductivity type epitaxial region, each segment at least partially separated from an adjacent segment by a terminating region, and the trench segments defining a plurality of polygonal body regions within the second conductivity type region. A first insulating layer at least partially lines each trench and a plurality of first conductive regions are provided within the trench segments adjacent to the first layer. Each of the conductive regions is connected to an adjacent conductive region by a connecting conductive region, overlying the terminating region, that bridges at least one of the terminating regions, and a plurality of first conductivity source regions are within upper portions of polygonal body regions and adjacent the trench segments, the source regions positioned outside the terminating regions.
申请公布号 US6472708(B1) 申请公布日期 2002.10.29
申请号 US20000653619 申请日期 2000.08.31
申请人 GENERAL SEMICONDUCTOR, INC. 发明人 HSHIEH FWU-IUAN;SO KOON CHONG;TSUI YAN MAN
分类号 H01L21/336;H01L29/423;H01L29/78;(IPC1-7):H01L27/01;H01L27/12;H01L29/76;H01L23/48;H01L27/108 主分类号 H01L21/336
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