SEMICONDUCTOR APPARATUS AND DRIVING METHOD THEREOF

摘要

PURPOSE: A CVD(Chemical Vapor Deposition) apparatus and a method for driving the same are provided to improve lifetime of a pump and uniformity of a deposited film by using a purge gas supply part. CONSTITUTION: The CVD apparatus comprises a process chamber(21), a pump part(23), a purge gas supply part(25), and a control part(27) for controlling the process chamber(21) and the purge gas supply part(25). The purge gas supply part(25) supplies a purge gas to outlet and inlet of the pump part(23). The purge gas is an inert gas. The process chamber(21) and the pump part(23) are interconnected to a pipe(29) for exhausting the remaining gas.