发明名称 |
Manufacture of integrated fluidic devices |
摘要 |
<p>In a method of fabricating a microstructure for microfluidics applications, a first layer of etchable material is formed on a suitable substrate. A mechanically stable support layer is formed over the etchable material. A mask is applied over the support to expose at least one opening in the mask. An anistropic etch is then performed through the opening to create a bore extending through the support layer to said layer of etchable material. After performing an isotropic etch through the bore to form a microchannel in the etchable material extending under the support layer, a further layer is deposited over the support layer until overhanging portions meet and thereby close the microchannel formed under the opening. <IMAGE></p> |
申请公布号 |
EP1254717(A1) |
申请公布日期 |
2002.11.06 |
申请号 |
EP20020253016 |
申请日期 |
2002.04.29 |
申请人 |
DALSA SEMICONDUCTOR INC. |
发明人 |
QUELLET, LUC;TYLER, HEATHER |
分类号 |
G01N31/20;B01L3/00;B81B1/00;B81C1/00;G01N35/08;G01N37/00;(IPC1-7):B01L3/00 |
主分类号 |
G01N31/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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