SUBSTRATE PROVIDED WITH ALIGNMENT MARK, MASK DESIGN METHOD, COMPUTER PROGRAM, MASK FOR EXPOSING SUCH MARK, DEVICE FABRICATING METHOD, AND DEVICE FABRICATED THEREBY

摘要

PURPOSE: A substrate provided with an alignment mark is provided to form an alignment mark capable of being aligned with a conventional alignment tool while displaying position errors corresponding to various kinds of patterns. CONSTITUTION: At least one relatively high reflectance area(3) for reflecting radiation of an alignment beam of radiation is formed. Relatively low reflectance areas(1) for reflecting less radiation of the alignment beam are formed. The alignment mark includes the relatively high reflectance area and the relatively low reflectance areas. The high reflectance area(s) is(are) segmented in the first and second directions both directions being substantially perpendicular with respect to each other so that the high reflectance areas comprise predominantly rectangular segments(23,25).