| 发明名称 |
SYSTEMS AND METHODS FOR GAS HYDRATE SLURRY FORMATION |
| 摘要 |
Gas hydrate slurry formation systems are provided. The gas hydrate slurry formation system includes a cavitation chamber configured to receive a fluid and a cavitation device placed within the cavitation chamber. The cavitation device is configured to form a plurality of bubbles within the fluid in the cavitation chamber. The gas hydrate slurry formation system also includes a gas inlet configured to introduce a gas within the cavitation chamber such that the gas is entrained in the plurality of bubbles to form a plurality of gas—entrained bubbles. The plurality of gas-entrained bubbles implode within the cavitation chamber to form a gas hydrate slurry. |
| 申请公布号 |
US2016376515(A1) |
申请公布日期 |
2016.12.29 |
| 申请号 |
US201415103172 |
申请日期 |
2014.12.11 |
| 申请人 |
Indian Institute of Technology Madras |
发明人 |
SANGWAI Jitendra |
| 分类号 |
C10L3/10;B01F15/06;B01F5/06;C07C7/20;B01F11/02;B01F15/00;B01J19/00;B01F3/04;B01F7/00 |
主分类号 |
C10L3/10 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A gas hydrate slurry formation system, comprising:
a cavitation chamber configured to receive a fluid; a cavitation device placed within the cavitation chamber, wherein the cavitation device is configured to form a plurality of bubbles within the fluid in the cavitation chamber; and a gas inlet configured to introduce a gas within the cavitation chamber such that the gas is entrained in the plurality of bubbles to form a plurality of gas-entrained bubbles, wherein the cavitation chamber is configured such that the plurality of gas-entrained bubbles implode within the cavitation chamber to form a gas hydrate slurry. |
| 地址 |
Tamil Nadu IN |
