| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a shadow mask wherein variations do not occur in the size of a photo-resist film opening part by making an exposure light entering into the mask for pattern exposure uniform. SOLUTION: In the manufacturing method of the shadow mask having at least a process to form the photo-resist film on a metal sheet, a process to perform pattern exposure via the mask for pattern exposure nearly adhered to the photo-resist film, a process to develop the photo-resist film, a process to perform etching on the thin metal sheet, and a process to peel off the photo- resist film, the exposure device for the shadow mask used for the pattern exposure is provided with a rectangular light source and a box-state reflecting plate having a face arranged by the rectangular light source as a ceiling face and having a face opposing to the ceiling face as an opening face, and a reflecting film is arranged at the two inner faces of the reflecting plate in nearly parallel with the rectangular light source.
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